QuantumClean® & ChemTrace® Show How to Reduce Wafer Fab CoO at SEMICON Europa 2018

Quakertown, PA USA. November 2018 – QuantumClean & ChemTrace will demonstrate how its ultra-high purity chamber tool part cleaning, proprietary coatings and microcontamination analytical testing can help reduce wafer fabrication Cost-of-Ownership (CoO). Solutions’ information is available during show hours at SEMICON Europa at the Messe München Exhibition Center in Munich, Germany from November 13 — 16, 2018 (booth A4510).

We will offer a series of presentations to inform IDMs, OEMs, OPMs and Foundries on how they can reduce CoO in the areas of ALD, CVD, Diffusion, Etch, Ion Implant, and PVD ultra-high purity cleaning and Parts Quality Monitoring customer solutions. Booth staff will discuss how — cleaner chambers start-up quicker — faster part turnaround times reduce inventory — longer Mean Time Between Cleans improve productivity and reduce PM costs — less aggressive cleaning methods and recoating extend part life.

QuantumClean® & ChemTrace® Show How to Reduce Wafer Fab CoO at SEMICON Europa 2018

“SEMICON Europa 2018 visitors can meet with our solution experts at our booth A4510 to learn how our differentiated service offerings can bring improvement to your operation by solving critical semiconductor process chamber part-related manufacturing challenges”, explains Scott Nicholas, EVP.

Visitors to the QuantumClean/ChemTrace booth will receive a complimentary gift.

ChemTrace® and QuantumClean® are units of the Semiconductor Services Business division of Ultra Clean Technology